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    Tantalum
    

                    
                    
    
                        
      
                          
    • Tantalum sputtering target
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                            Tantalum sputtering target                        
    
                    
      
                               
                    
                    
    
                	
    Tantalum sputtering target
    
                            
      
                                
    • Material: R05200
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    • Purity: ≥99.95%, ≥99.99%
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    • Dimension: Customization
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    • Standard: ASTM B708-2012
      • 
                                
    • Application:  Used for optical fiber, semiconductor wafer and integrated circuit of sputtering deposition coating. Used for glass, ceramic, LCD coating. Used for the cathode sputtering coating, high vacuum suction 
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	Material: R05200

    

    
	Purity: ≥99.95%,
≥99.99%

    

    
	Dimension: Customization

    

    
	Standard:
ASTM B708-2012

    
Application: Used for
optical fiber, semiconductor wafer and integrated circuit of sputtering
deposition coating. Used for glass, ceramic, LCD coating. Used for the cathode
sputtering coating, high vacuum suction active material etc.                    
    

                   

                
    
                      
                
            
    


            
		  
		  
        
    
    
     
    
    






    
  
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